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Direct mapping of the electric permittivity of heterogeneous non-planar thin films at gigahertz frequencies by scanning microwave microscopy

机译:通过扫描微波显微镜直接绘制千兆赫频率下异质非平面薄膜的介电常数

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摘要

We obtained maps of electric permittivity at ∼19 GHz frequencies on non-planar thin film heterogeneous samples by means of combined atomic force-scanning microwave microscopy (AFM-SMM). We show that the electric permittivity maps can be obtained directly from the capacitance images acquired in contact mode, after removing the topographic cross-talk effects. This result demonstrates the possibility of identifying the electric permittivity of different materials in a thin film sample irrespectively of their thickness by just direct imaging and processing. We show, in addition, that quantitative maps of the electric permittivity can be obtained with no need for any theoretical calculation or complex quantification procedures when the electric permittivity of one of the materials is known. To achieve these results the use of contact mode imaging is a key factor. For non-contact imaging modes the effects of local sample thickness and of the imaging distance make the interpretation of the capacitance images in terms of the electric permittivity properties of the materials much more complex. The present results represent a substantial contribution to the field of nanoscale microwave dielectric characterization of thin film materials with important implications for the characterization of novel 3D electronic devices and 3D nanomaterials
机译:通过组合原子力扫描微波显微镜(AFM-SMM),我们获得了非平面薄膜非均质样品在〜19 GHz频率下的介电常数图。我们显示,在去除地形串扰效应后,可以直接从以接触模式获取的电容图像中获得电容率图。该结果证明了仅通过直接成像和处理就可以识别薄膜样品中不同材料的介电常数,而不论其厚度如何。此外,我们表明,当已知一种材料的介电常数时,无需任何理论计算或复杂的定量过程即可获得介电常数的定量图。为了获得这些结果,接触模式成像的使用是关键因素。对于非接触式成像模式,局部样品厚度和成像距离的影响使得根据材料的介电常数特性对电容图像的解释更加复杂。本结果代表了对薄膜材料的纳米级微波介电表征领域的重大贡献,对新型3D电子器件和3D纳米材料的表征具有重要意义

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